China-backed Aishengna starts low-volume immersion DUV lithography production

China-backed Aishengna starts low-volume immersion DUV lithography production

Reuters identified Shanghai state-owned Aishengna as the maker behind China’s first domestic immersion DUV tools, with initial deliveries expected this year as analysts question yield, reliability and scale versus ASML.

Summary

Shanghai Aishengna Electronic Technology Group, a state-backed company identified by Reuters as the previously unnamed manufacturer, has begun low-volume production of domestically developed immersion DUV lithography machines for planned delivery this year to Chinese chipmakers including SMIC, Hua Hong Semiconductor and ChangXin Memory Technologies. The Information reported output targets of about five units this year and roughly 20 in 2027. The development marks progress in China’s semiconductor self-sufficiency push, but analysts told CNBC it is unlikely to materially challenge ASML in the near term because the Chinese tools still require further testing and trail ASML’s systems on yield, reliability, fleet support and production scale. ASML shares fell as much as 8% on Monday and were down 1.8% on Tuesday, though analysts said locally built tools may mostly replace revenue already constrained by export controls rather than erode ASML’s sold-out global order book.

Terms & Concepts
  • immersion DUV lithography: A semiconductor manufacturing method that uses deep ultraviolet light and a layer of water to print finer circuit patterns on wafers.
  • yield: The percentage of usable chips produced in a manufacturing process.
  • EUV systems: Extreme-ultraviolet lithography tools used to manufacture the world’s most advanced semiconductors.